• DocumentCode
    352196
  • Title

    A new strong inversion 5-parameter transistor mismatch model

  • Author

    Serrano-Gotarredona, Teresa ; Linares-Barranco, Bernabé

  • Author_Institution
    Nat. Microelectron. Center, Sevilla, Spain
  • Volume
    4
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    381
  • Abstract
    A new 5-parameter MOS transistor mismatch model is introduced capable of predicting transistor mismatch with very high accuracy for ohmic and saturation strong inversion regions, including short channel transistors. The new model is based on splitting the contribution of the mobility degradation parameter mismatch into two components, and modulating them as the transistor transitions from ohmic to saturation regions. The model is tested for a wide range of transistor sizes (30), and shows excellent precision, never reported before for such a wide range of transistor sizes, including short channel transistors
  • Keywords
    MOSFET; carrier mobility; semiconductor device models; MOS transistor; five-parameter mismatch model; mobility degradation parameter; ohmic region; parameter extraction; saturation region; short channel transistor; strong inversion region; Degradation; Electronic mail; Intrusion detection; Length measurement; MOSFETs; Microelectronics; Predictive models; Size measurement; Strontium; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 2000. Proceedings. ISCAS 2000 Geneva. The 2000 IEEE International Symposium on
  • Conference_Location
    Geneva
  • Print_ISBN
    0-7803-5482-6
  • Type

    conf

  • DOI
    10.1109/ISCAS.2000.858768
  • Filename
    858768