DocumentCode
352196
Title
A new strong inversion 5-parameter transistor mismatch model
Author
Serrano-Gotarredona, Teresa ; Linares-Barranco, Bernabé
Author_Institution
Nat. Microelectron. Center, Sevilla, Spain
Volume
4
fYear
2000
fDate
2000
Firstpage
381
Abstract
A new 5-parameter MOS transistor mismatch model is introduced capable of predicting transistor mismatch with very high accuracy for ohmic and saturation strong inversion regions, including short channel transistors. The new model is based on splitting the contribution of the mobility degradation parameter mismatch into two components, and modulating them as the transistor transitions from ohmic to saturation regions. The model is tested for a wide range of transistor sizes (30), and shows excellent precision, never reported before for such a wide range of transistor sizes, including short channel transistors
Keywords
MOSFET; carrier mobility; semiconductor device models; MOS transistor; five-parameter mismatch model; mobility degradation parameter; ohmic region; parameter extraction; saturation region; short channel transistor; strong inversion region; Degradation; Electronic mail; Intrusion detection; Length measurement; MOSFETs; Microelectronics; Predictive models; Size measurement; Strontium; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems, 2000. Proceedings. ISCAS 2000 Geneva. The 2000 IEEE International Symposium on
Conference_Location
Geneva
Print_ISBN
0-7803-5482-6
Type
conf
DOI
10.1109/ISCAS.2000.858768
Filename
858768
Link To Document