DocumentCode :
3522953
Title :
Deep, vertical etching of hi-silica films for optical waveguide applications
Author :
McLaughlin, A.J. ; Bonar, J.R. ; Jubber, M.G. ; Marques, P.V.S. ; Hicks, S.E. ; Wilkinson, C.D.W. ; Aitchison, J.S.
Author_Institution :
University of Glasgow, Department of Electronics and Electrical Engineering
Volume :
11
fYear :
1997
fDate :
18-23 May 1997
Firstpage :
508
Lastpage :
509
Keywords :
Dry etching; Fires; Glass; Light sources; Optical device fabrication; Optical fiber communication; Optical films; Optical sensors; Optical waveguides; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1997. CLEO '97., Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-4125-2
Type :
conf
DOI :
10.1109/CLEO.1997.603515
Filename :
603515
Link To Document :
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