Title :
FreePDK v2.0: Transitioning VLSI education towards nanometer variation-aware designs
Author :
Stine, James E. ; Chen, Jun ; Castellanos, Ivan ; Sundararajan, Gopal ; Qayam, Mohammad ; Kumar, Praveen ; Remington, Justin ; Sohoni, Sohum
Author_Institution :
Electr. & Comput. Eng. Dept., Oklahoma State Univ., Stillwater, OK, USA
Abstract :
This paper discusses an extension to an open source, variation aware process design kit (PDK), based on scalable CMOS design rules. This PDK is designed for 45 nm feature sizes and is utilized for use in VLSI research, computer architecture, education and small businesses. This kit includes all the necessary layout design rules and extraction command decks to capture layout dependent systematic variation and perform statistical circuit analysis. The kit also includes a standard cell library, MIPSreg processor and associated GNU-compliant compiler and the necessary support files to enable full chip place and route and verification for system on chip designs. An analog and digital system test chip is also included with this PDK-extension allowing exploration of nanometer-based VLSI designs.
Keywords :
CMOS integrated circuits; VLSI; electronic engineering education; integrated circuit design; integrated circuit layout; nanotechnology; statistical analysis; system-on-chip; FreePDK v2.0; MIPS processor; VLSI education transitioning; analog system test chip; associated GNU-compliant compiler; computer architecture; digital system test chip; layout dependent systematic variation; layout design rules; nanometer variation-aware design; scalable CMOS design rules; size 45 nm; standard cell library; statistical circuit analysis; system on chip design; variation aware process design kit; very large scale integration design; CMOS process; Circuit analysis; Circuit testing; Computer architecture; Computer science education; Digital systems; Process design; Software libraries; System-on-a-chip; Very large scale integration;
Conference_Titel :
Microelectronic Systems Education, 2009. MSE '09. IEEE International Conference on
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-4407-6
Electronic_ISBN :
978-1-4244-4406-9
DOI :
10.1109/MSE.2009.5270820