• DocumentCode
    3526212
  • Title

    Laser-micromachining for 3D silicon detectors

  • Author

    Christophersen, Marc ; Phlips, Bernard F.

  • Author_Institution
    U.S. Naval Res. Lab., Washington, DC, USA
  • fYear
    2010
  • fDate
    Oct. 30 2010-Nov. 6 2010
  • Firstpage
    378
  • Lastpage
    381
  • Abstract
    We laser-micromachined hole arrays into silicon with aspect ratios up to 100:1. Direct laser-drilling and trepanning were used. Since laser-machining leaves a damaged silicon region that is not suitable for detector fabrication, we removed the damaged silicon with an isotropic xenon difluoride etch step. Hole arrays with trepan drilled holes had lower leakage currents. We successfully collected a Co-57 photon spectrum (energy resolution: 3.0 keV FWHM at 122 KeV) with a 3D silicon detector based on trepan-drilled holes. Our results show that silicon laser-machining can be used for 3D detector fabrication with good charge collection properties.
  • Keywords
    laser beam etching; leakage currents; micromachining; silicon radiation detectors; 3D detector fabrication; 3D silicon detector; Co-57 photon spectrum; aspect ratio; energy resolution; isotropic xenon difluoride etching process; leakage current; silicon laser-machining hole array; silicon region; Detectors; Etching; Laser modes; Semiconductor lasers; Silicon; Three dimensional displays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium Conference Record (NSS/MIC), 2010 IEEE
  • Conference_Location
    Knoxville, TN
  • ISSN
    1095-7863
  • Print_ISBN
    978-1-4244-9106-3
  • Type

    conf

  • DOI
    10.1109/NSSMIC.2010.5873784
  • Filename
    5873784