DocumentCode
3526212
Title
Laser-micromachining for 3D silicon detectors
Author
Christophersen, Marc ; Phlips, Bernard F.
Author_Institution
U.S. Naval Res. Lab., Washington, DC, USA
fYear
2010
fDate
Oct. 30 2010-Nov. 6 2010
Firstpage
378
Lastpage
381
Abstract
We laser-micromachined hole arrays into silicon with aspect ratios up to 100:1. Direct laser-drilling and trepanning were used. Since laser-machining leaves a damaged silicon region that is not suitable for detector fabrication, we removed the damaged silicon with an isotropic xenon difluoride etch step. Hole arrays with trepan drilled holes had lower leakage currents. We successfully collected a Co-57 photon spectrum (energy resolution: 3.0 keV FWHM at 122 KeV) with a 3D silicon detector based on trepan-drilled holes. Our results show that silicon laser-machining can be used for 3D detector fabrication with good charge collection properties.
Keywords
laser beam etching; leakage currents; micromachining; silicon radiation detectors; 3D detector fabrication; 3D silicon detector; Co-57 photon spectrum; aspect ratio; energy resolution; isotropic xenon difluoride etching process; leakage current; silicon laser-machining hole array; silicon region; Detectors; Etching; Laser modes; Semiconductor lasers; Silicon; Three dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Nuclear Science Symposium Conference Record (NSS/MIC), 2010 IEEE
Conference_Location
Knoxville, TN
ISSN
1095-7863
Print_ISBN
978-1-4244-9106-3
Type
conf
DOI
10.1109/NSSMIC.2010.5873784
Filename
5873784
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