Title :
A precision dose control circuit for vertically aligned carbon nanofiber based maskless lithography
Author :
Islam, S.K. ; Eliza, S.A. ; Bull, N.D. ; Rahman, T. ; Blalock, B. ; Baylor, L.R. ; Ericson, M.N. ; Gardner, W.L.
Author_Institution :
MinH. Kao Dept. of Electr. Eng. & Comput. Sci., Univ. of Tennessee, Knoxville, TN, USA
Abstract :
This paper presents a precision control circuit for the emission of desired number of electrons from vertically aligned carbon nanofibers (VACNFs) for the realization of a massively parallel maskless e-beam lithography system.The digitally addressable field emission arrays (DAFEAs) of the VACNFs function as the lithography heads for massively parallel e-beam exposure of resist eliminating the cost of photomasks.
Keywords :
carbon fibres; electron resists; field emitter arrays; nanofibres; precision engineering; C; DAFEA; VACNF; digitally addressable field emission arrays; maskless e-beam lithography; photomasks; precision dose control circuit; resist; vertically aligned carbon nanofiber; Brightness; Circuits; Helium; Ion sources; Ionization; Lithography; Microscopy; Numerical simulation; Shape; Temperature dependence;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2009. IVNC 2009. 22nd International
Conference_Location :
Shizuoka
Print_ISBN :
978-1-4244-3587-6
Electronic_ISBN :
978-1-4244-3588-3
DOI :
10.1109/IVNC.2009.5271585
