Title :
In-situ magnetoresistance measurements of a nanoconstricted nickel-iron film with in-plane configuration
Author_Institution :
Toshiba Corp., Kawasaki, Japan
Abstract :
A nanoscale NiFe permalloy point-contact was fabricated in planar configuration on a MgO substrate using an etching process with a horizontal incidence ion beam. In-situ anisotropic magnetoresistance (MR) measurements were successively performed in a vacuum to prevent oxidation. After around 800 seconds of milling, the MR ratio steeply increased to about 2.3% which was much larger than the anisotropic MR ratio of the MR film. In addition, the test-element showed low (high) resistance with parallel (anti-parallel) magnetic geometry of the pinned and free area.
Keywords :
Permalloy; etching; ion beam effects; magnetic domain walls; magnetic thin films; magnetoresistance; milling; nanostructured materials; point contacts; MgO; NiFe; NiFe permalloy point-contact; anisotropic magnetoresistance; etching process; free area; horizontal incidence ion beam; in-plane configuration; in-situ magnetoresistance measurements; magnetic geometry; milling; nanoconstricted nickel-iron film; oxidation; pinned area; Anisotropic magnetoresistance; Electrical resistance measurement; Etching; Ion beams; Magnetic films; Milling; Oxidation; Performance evaluation; Substrates; Testing;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1463440
