• DocumentCode
    3526473
  • Title

    Nano-diamond ridge structure emission arrays capped on micro-patterned silicon pillars

  • Author

    Ghosh, N. ; Kang, W.P. ; Raina, S. ; Davidson, J.L.

  • Author_Institution
    Dept. of Electr. Eng., Vanderbilt Univ., Nashville, TN, USA
  • fYear
    2009
  • fDate
    20-24 July 2009
  • Firstpage
    179
  • Lastpage
    180
  • Abstract
    CVD nano-diamond structures are interesting electron emitters because of their superior electronic properties and tolerance to operate at much higher temperatures and harsh environments. Other advantages of nano-diamond as emitters include chemical and electrical stability, high breakdown voltage, low turn-on electric field and excellent thermal conductivity. In this paper, the authors report the fabrication and observation of electron field emission from an array nano-diamond ridge structure capped on micropatterned silicon pillars.
  • Keywords
    cathodes; diamond; electron field emission; nanostructured materials; nanotechnology; plasma CVD coatings; silicon; Si; electron emitter; micropatterned silicon pillars; nanodiamond ridge structure emission array; plasma enhanced chemical vapor deposition; Aluminum; Chemical vapor deposition; Electron emission; Fabrication; Nanostructures; Plasma temperature; Silicon; Testing; Thermal conductivity; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2009. IVNC 2009. 22nd International
  • Conference_Location
    Shizuoka
  • Print_ISBN
    978-1-4244-3587-6
  • Electronic_ISBN
    978-1-4244-3588-3
  • Type

    conf

  • DOI
    10.1109/IVNC.2009.5271594
  • Filename
    5271594