Strong atmospheric stability of carbon nanotubes under high temperature annealing

Author

Lim, Han Eol ; Ryu, Je Hwang ; Son, Byung Taek ; Oh, Hye Mi ; Bae, Na Young ; Jang, Jin ; Moon, Jong Hynn ; Nakamoto, Masayuki ; Park, Kyu Chang

Author_Institution

Dept. of Inf. Display, Kyung Hee Univ., Seoul, South Korea

fYear

2009

fDate

20-24 July 2009

Firstpage

23

Lastpage

24

Abstract

In this paper, three types of multi walled carbon nanotubes (CNTs) were grown with a conventional method (Type I), resist-assisted patterning (Type II, RAP), and robust (Type III) method. Electron emission current were compared with atmospheric stability of CNTs grown through plasma enhanced chemical vapor deposition. For environmental stability measurements, these samples were annealed in 700 degC furnace up to 10 hr and/or rapid thermal annealing system under ambient environment. The detailed structural changes were evaluated through SEM with various ambient annealing time and relationship to electron emission current.

Keywords

carbon nanotubes; electron emission; nanopatterning; plasma CVD; rapid thermal annealing; scanning electron microscopy; thermal stability; C; SEM; ambient environment; atmospheric stability; conventional method; electron emission current; multiwalled carbon nanotubes; plasma enhanced chemical vapor deposition; rapid thermal annealing; resist-assisted patterning; robust method; structural changes; temperature 700 degC; time 10 h; Carbon nanotubes; Chemical vapor deposition; Electron emission; Plasma chemistry; Plasma measurements; Plasma stability; Plasma temperature; Rapid thermal annealing; Robustness; Thermal stability;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Nanoelectronics Conference, 2009. IVNC 2009. 22nd International

Conference_Location

Shizuoka

Print_ISBN

978-1-4244-3587-6

Electronic_ISBN

978-1-4244-3588-3

Type

conf

DOI

10.1109/IVNC.2009.5271625

Filename

5271625