Title :
Modeling exchange bias in thin films and nanostructures
Author :
Nowak, U. ; Beckmann, Benjamin ; Scholten, G. ; Usadel, K.D.
Author_Institution :
Fachbereich Physik, Duisburg-Essen Univ., Duisburg, Germany
Abstract :
We report on results obtained with a mean-field type calculation for an exchange bias (EB) system consisting of a ferromagnetic (FM) monolayer in contact with an antiferromagnetic (AFM) thin film. Both the bias field Heb and the coercivity Hc are calculated. The AFM layer is magnetically diluted and different degrees of dilution ranging from zero to 50% are considered. The results obtained for the bias fields are in qualitative agreement with those obtained previously with Monte Carlo simulations. For the coercivity Hc we find in agreement with experiments a strong maximum around the blocking temperature where Heb vanishes. This maximum is also present for zero dilution of the AFM for which the EB field must vanish, since we are considering ideal compensated interfaces. We also study the EB of a system consisting of FM nanodots in contact with an AFM film systematically, showing the decreasing influence of the domains in the AFM layer as the lateral size of the FM dots are below the average size of the AFM domains.
Keywords :
antiferromagnetism; coercive force; dilute magnetic materials; ferromagnetism; interface magnetism; magnetic domains; magnetic thin films; monolayers; nanostructured materials; antiferromagnetic domains; bias field; blocking temperature; coercivity; exchange bias system; ferromagnetic monolayer; ferromagnetic nanodots; ideal compensated interfaces; magnetically diluted antiferromagnetic thin film; mean-field type calculation; Anisotropic magnetoresistance; Atomic force microscopy; Coercive force; Cooling; Erbium; Fluctuations; Hysteresis; Physics; Transistors;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1463511