Title :
Application of the time domain current response method to the examination of dysprosium oxide capacitors
Author :
Wiktorczyk, T. ; Bober, Z. ; Nitsch, K.
Author_Institution :
Tech. Univ. of Wroclaw, Poland
Abstract :
The authors report the results of time-domain current response measurements of Al/Dy2O3/Al sandwiches and of the evaluation of their complex capacitance in the frequency domain. The observed dielectric response comes either from the volume of dysprosium oxide thin film or from the interfacial layers at both metal/insulator boundaries. In general, the volume of Dy2O3 film is responsible for the dielectric response at high frequencies and lower temperatures, whereas Al/Dy2O3 boundaries have an effect at low frequencies and high temperatures. The C"(f ) peaks appear as the consequence of the interaction of volume and interfacial processes. Multihour annealing of samples at 523 K reduces the electrical conductivity, shifts the C" peaks toward low frequencies without changing their activation energy, and slightly modifies the shape of the dispersion curves, lowering the values of their slopes
Keywords :
annealing; capacitance; capacitors; dysprosium compounds; frequency-domain analysis; metal-insulator-metal devices; metal-insulator-metal structures; time-domain analysis; 523 K; Al-Dy2O3-Al sandwiches; Dy2O3 film; MIM; activation energy; annealing; capacitors; complex capacitance; dielectric response; dispersion curves; electrical conductivity; frequency domain; interfacial layers; metal/insulator boundaries; time domain current response method; Capacitance measurement; Current measurement; Dielectric measurements; Dielectric thin films; Dielectrics and electrical insulation; Frequency domain analysis; Frequency measurement; Metal-insulator structures; Temperature; Time domain analysis;
Conference_Titel :
Conduction and Breakdown in Solid Dielectrics, 1989., Proceedings of the 3rd International Conference on
Conference_Location :
Trondheim
DOI :
10.1109/ICSD.1989.69189