DocumentCode :
3529802
Title :
Selective etching in laser-written semiconductor-doped glasses
Author :
Smuk, A.Y. ; Lawandy, N.M.
Author_Institution :
Dept. of Phys., Brown Univ., Providence, RI, USA
fYear :
1998
fDate :
3-8 May 1998
Firstpage :
187
Lastpage :
188
Abstract :
Summary form only given. Direct laser writing on the surface of the semiconductor-doped glass (SDG) is based on the absorptive properties of the material and the ability of the melted volume to expand and resolidify above the surface, forming smooth topographic features with positive relief. This single-step technique is useful for a number of applications including the fabrication of diffractive and refractive microoptics and is particularly suitable for rapid prototyping. In this work we report on the observation of selective wet etching process, which takes place once relief features are created.
Keywords :
etching; laser materials processing; optical fabrication; optical glass; semiconductor doped glasses; diffractive microoptics; direct laser writing; fabrication; rapid prototyping; refractive microoptics; resolidification; selective wet etching; semiconductor doped glass; surface relief; surface topography; Diffraction; Etching; Fabrication; Glass; Optical materials; Semiconductor lasers; Semiconductor materials; Surface emitting lasers; Surface topography; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-339-0
Type :
conf
DOI :
10.1109/CLEO.1998.676034
Filename :
676034
Link To Document :
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