DocumentCode
3530197
Title
Power density aware power gate placement optimization scheme
Author
Yong, Lee Kee ; Ung, Chee Kong
Author_Institution
Intel Microelectron., Bayan Lepas, Malaysia
fYear
2010
fDate
3-4 Aug. 2010
Firstpage
38
Lastpage
42
Abstract
As we are marching towards deeper sub-micron technology from process scaling, the transistor leakage itself had became more and more dominant to the total component power, which is unavoidable. Clever employment of power gating / sleep transistor / MTCMOS technology can help to shut off leakage power from un-use blocks. However over placement of power gate cells to reduce ON stage IR voltage drop can yield higher leakage power during OFF stage at high temperature and fast skew. This paper described the circuit analysis, optimization strategies and design methodology to tackle this issue head on. A proposal on power gate placement optimization using the concept of power windowing and Power Perimeter Scan (PPS) was introduced in this paper. Details break down of circuit modeling and design trade off on Power Gating FETs was described including simulation results and equations to aid the illustrations. The overall power saving using MTCMOS was re-evaluated for total leakage minimization.
Keywords
CMOS integrated circuits; circuit optimisation; integrated circuit design; leakage currents; low-power electronics; network analysis; system-on-chip; MTCMOS technology; circuit analysis; power density aware power gate placement optimization scheme; power gating; power perimeter scan; power windowing; sleep transistor; Circuit analysis; Circuit simulation; Design methodology; Design optimization; Employment; Equations; FETs; Proposals; Temperature; Voltage; IR Drop; MTCMOS; Optimization; Power Gating;
fLanguage
English
Publisher
ieee
Conference_Titel
Quality Electronic Design (ASQED), 2010 2nd Asia Symposium on
Conference_Location
Penang
Print_ISBN
978-1-4244-7809-5
Type
conf
DOI
10.1109/ASQED.2010.5548158
Filename
5548158
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