Title :
Microstructural study of nanocrystalline soft magnetic thin films of Fe-C and Fe-Co-C deposited by facing targets sputtering
Author :
Kitamoto, Y. ; Kiyota, G.
Author_Institution :
Dept. of Innovative & Eng. Mater., Tokyo Inst. of Technol., Yokohama, Japan
Abstract :
In the present paper, we describe the fabrication of the Fe-C and Fe-Co-C thin films by facing-targets sputtering (FTS) method at room temperature and the investigation of the relationship between microstructure and magnetic properties. Fe-C and Fe-Co-C films were fabricated by a FTS apparatus with two targets of Fe or Fe65Co35 with C chips at room temperature. Sputtering was performed in pure Ar and films of about 300-500 nm in thickness were deposited on fused quartz and Si substrates. Crystal structure, microstructure and magnetic properties were investigated by X-ray diffraction, transmission electron microscopy, Mossbauer spectroscopy and by a vibrating sample magnetometer. Nanocrystals with higher magnetic moment and lower carbon content were dispersed in an amorphous matrix with lower moment and higher carbon content. Carbon-doping decreased the crystallite size while soft magnetic properties with small internal stress were obtained for the films.
Keywords :
Mossbauer effect; X-ray diffraction; amorphous magnetic materials; cobalt compounds; coercive force; crystal microstructure; crystal structure; crystallites; ferromagnetic materials; internal stresses; iron compounds; magnetic moments; magnetic thin films; nanostructured materials; soft magnetic materials; sputtered coatings; transmission electron microscopy; 293 to 298 K; FeC; FeCoC; Mossbauer spectroscopy; Si; SiO2; X-ray diffraction; carbon doping; crystal structure; facing targets sputtering; internal stress; magnetic moment; magnetic properties; microstructure; nanocrystalline soft magnetic thin films; room temperature; transmission electron microscopy; vibrating sample magnetometer; Argon; Crystal microstructure; Crystallization; Fabrication; Iron; Magnetic films; Magnetic properties; Semiconductor films; Sputtering; Temperature;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1463692