DocumentCode :
3531720
Title :
A Framework for TSV Serialization-aware Synthesis of Application Specific 3D Networks-on-Chip
Author :
Pasricha, Sudeep
Author_Institution :
Colorado State Univ., Fort Collins, CO, USA
fYear :
2012
fDate :
7-11 Jan. 2012
Firstpage :
268
Lastpage :
273
Abstract :
With increasing performance-per-watt implementation requirements for emerging applications and barriers in interconnect scaling for ultra-deep sub micron (UDSM) technologies, traditional 2D integrated circuits (2D-ICs) are being pushed to their limit. Three dimensional integrated circuits (3D-ICs) have recently emerged as a promising solution that can overcome many of the performance, area, and power concerns in 2D-ICs. In this paper we propose a novel framework (MORPHEUS) for the synthesis of application-specific 3D networks on chip (NoCs). The goal is to generate 3D NoCs that meet application performance constraints while minimizing power dissipation. MORPHEUS incorporates thermal-aware core layout, 3D topology and route generation, and placement of network interfaces (NIs), routers, and serialized vertical through silicon vias (TSVs). Experimental studies on several chip multiprocessor (CMP) applications indicate that our generated solutions notably reduce power dissipation (up to 2.3×) and average latency (up to 1.2×) over 2D NoCs. Comparisons with a previous work on application-specific 3D NoC synthesis also show improvements in power dissipation (up to 1.9×) and average latency (up to 1.6×).
Keywords :
integrated circuit interconnections; microprocessor chips; network-on-chip; three-dimensional integrated circuits; 2D integrated circuits; 2D-IC; 3D topology; CMP applications; MORPHEUS; NI; TSV serialization-aware synthesis; UDSM technologies; application specific 3D networks-on-chip synthesis; application-specific 3D NoC synthesis; chip multiprocessor applications; interconnect scaling; network interfaces; performance-per-watt implementation requirements; power dissipation reduction; route generation; serialized vertical through silicon via; three dimensional integrated circuits; ultradeep sub micron technologies; Bandwidth; Layout; Nickel; Power dissipation; Three dimensional displays; Through-silicon vias; 3D; NoC; networks on chip; synthesis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Design (VLSID), 2012 25th International Conference on
Conference_Location :
Hyderabad
ISSN :
1063-9667
Print_ISBN :
978-1-4673-0438-2
Type :
conf
DOI :
10.1109/VLSID.2012.82
Filename :
6167763
Link To Document :
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