Title : 
A Parasitic Effect - Free Test Scheme for Ferroelectric Random Access Memory (FRAM)
         
        
            Author : 
Ruan, A.W. ; Hu, B. ; Zhai, Y.H.
         
        
            Author_Institution : 
State key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu
         
        
        
        
        
        
            Abstract : 
Since area of FRAM capacitors is smaller, mismatch of bit line capacitors induced by parasitic capacitors of output bit lines and measurement instrument will generate false output. A parasitic effect-free test scheme for FRAM with 2T2C (two transistors two capacitors) architecture is proposed in the paper after investigation of operational principle of sense amplifier. In the proposed scheme, a specific unity gain circuit was designed and connected to the output bit lines of a FRAM cell to separate FRAM capacitors from bit line capacitors. Experimental results demonstrate that correct output can be achieved with parasitic effect-free test scheme, even in the presence of mismatch of bit line capacitors.
         
        
            Keywords : 
ferroelectric capacitors; ferroelectric storage; random-access storage; 2T2C architecture; FRAM capacitor; bit line capacitor; ferroelectric random access memory; parasitic capacitor; parasitic effect-free test; sense amplifier; unity gain circuit design; Circuit testing; Ferroelectric films; Ferroelectric materials; Laboratories; MOS capacitors; MOSFETs; Nonvolatile memory; Operational amplifiers; Random access memory; Threshold voltage;
         
        
        
        
            Conference_Titel : 
Testing and Diagnosis, 2009. ICTD 2009. IEEE Circuits and Systems International Conference on
         
        
            Conference_Location : 
Chengdu
         
        
            Print_ISBN : 
978-1-4244-2587-7
         
        
        
            DOI : 
10.1109/CAS-ICTD.2009.4960764