Title :
Application of spin valve sensor for scanning magnetoresistance microscope
Author :
Takezaki, T. ; Yagisawa, D. ; Sueoka, K.
Author_Institution :
Graduate Sch. of Inf. Sci. & Technol., Hokkaido Univ., Sapporo, Japan
Abstract :
A cantilever with spin valve sensor has been fabricated using photo and electron beam (EB) lithography, liftoff and bulk micromachining techniques. A four-point sensor configuration was used which has the advantages of neglecting resistance of lead electrodes and improving the signal-noise ratio (SNR) due to the reduction of total resistance of the magnetoresistive sensors.
Keywords :
electric resistance; electric sensing devices; electron beam lithography; magnetic sensors; micromachining; spin valves; bulk micromachining; cantilever; electron beam lithography; four-point sensor configuration; lead electrodes; liftoff; magnetoresistive sensors; photolithography; resistance; scanning magnetoresistance microscope; signal-noise ratio; spin valve sensor; Anisotropic magnetoresistance; Fabrication; Magnetic field measurement; Magnetic force microscopy; Magnetic sensors; SQUIDs; Scanning probe microscopy; Sensor phenomena and characterization; Spin valves; Sputtering;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1463785
