DocumentCode
3532664
Title
Failure Analysis on the Chip Capacitor
Author
Wang Yang ; He Wei ; Mo Yunqi ; Wang Shou-Xu ; Wu Xiang-Hao ; He Bo ; Zhang Xuan-Dong
Author_Institution
Reliability Res. & Anal. Center, MII, Guangzhou
fYear
2009
fDate
28-29 April 2009
Firstpage
1
Lastpage
4
Abstract
The analysis process and methods of a failure chip capacitor have been introduced by a failure analysis case for an actual chip capacitor with visual inspection, cross section analysis and SEM & EDS analysis. The analysis results show that the parallel resistance characteristic existed in chip capacitor is main cause for failure; The crack existed in ceramic dielectric materials between two electrodes of multilayer capacitor was arisen from chip capacitor manufacture obviously. The contribution of failure analysis to quality control of manufacturing process of semiconductor was also displayed.
Keywords
ceramic capacitors; failure analysis; inspection; scanning electron microscopy; EDS analysis; SEM analysis; ceramic dielectric materials; cross section analysis; electrodes; failure analysis; failure chip capacitor; manufacturing process; multilayer capacitor; parallel resistance; quality control; visual inspection; Capacitors; Ceramics; Dielectric materials; Electrodes; Failure analysis; Inspection; Manufacturing processes; Nonhomogeneous media; Quality control; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Testing and Diagnosis, 2009. ICTD 2009. IEEE Circuits and Systems International Conference on
Conference_Location
Chengdu
Print_ISBN
978-1-4244-2587-7
Type
conf
DOI
10.1109/CAS-ICTD.2009.4960818
Filename
4960818
Link To Document