Title :
Fabrication of ultra high aspect ratio silica nanocone arrays by multiple shrinking mask etching
Author :
Choi, Hyungryul J. ; Cornago, Ignacio ; Kim, Jeong-Gil ; Savas, Tim ; Barbastathis, George
Author_Institution :
Dept. of Mech. Eng., Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
We propose and experimentally demonstrate a novel method to fabricate subwavelength silica nanocone arrays with high aspect ratio (~7) for multifunctional surfaces having anti-reflective, self-cleaning, and anti-fogging properties.
Keywords :
nanofabrication; nanophotonics; nanostructured materials; optical arrays; optical fabrication; silicon compounds; SiO2; antifogging properties; antireflective properties; aspect ratio; multifunctional surfaces; multiple shrinking mask etching; self-cleaning properties; silica nanocone array fabrication; Etching; Nanostructures; Optical device fabrication; Optical films; Silicon compounds; anti-fogging; anti-reflective; enhanced transmission; high aspect ratio nanostructure; self-cleaning; wetting;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
Conference_Location :
Banff, AB
Print_ISBN :
978-1-4577-1511-2
DOI :
10.1109/OMEMS.2012.6318772
