DocumentCode :
3533674
Title :
Wafer-scale silica optomechanical oscillators with low threshold power and low phase noise for monolithic optical frequency references
Author :
Grine, Alejandro J. ; Quack, Niels ; Grutter, Karen ; Rocheleau, Tristan O. ; Huang, Jie ; Nguyen, Chuong T. ; Wu, Ming C.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA
fYear :
2012
fDate :
6-9 Aug. 2012
Firstpage :
51
Lastpage :
52
Abstract :
We present wafer-scale processed optomechanical oscillators with low threshold power (<;120μW) owing to high Qoptical = 5.3M, with phase noise of -110dBc/Hz (10kHz offset, 18.6MHz carrier). Phase noise is modeled, and measured vs. Qoptical and Qmechanical.
Keywords :
integrated optics; optical fabrication; optical resonators; oscillators; radiation pressure; silicon compounds; SiO2; low phase noise; low threshold power; monolithic optical frequency references; wafer scale silica optomechanical oscillator; Noise measurement; Optical device fabrication; Optical noise; Optical ring resonators; Optical variables measurement; Phase noise; Q factor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
Conference_Location :
Banff, AB
ISSN :
2160-5033
Print_ISBN :
978-1-4577-1511-2
Type :
conf
DOI :
10.1109/OMEMS.2012.6318797
Filename :
6318797
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3533674
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