Title :
In-situ fabrication of {111} mirror and optical bench using double-sided anisotropic wet etching of {100} silicon wafer
Author :
Kim, Jung-Mu ; Kim, Hyunseok ; Yoo, Sunghyun ; Lee, Kook-Nyung ; Kim, Yong-Kweon
Author_Institution :
Dept. of Electron. Eng., Chonbuk Nat. Univ., Jeonju, South Korea
Abstract :
This work presents a novel fabrication method for {111} dual mirror and optical bench using double-sided anisotropic wet etching of <;100>; oriented silicon wafer. The roughness of the wet etched {111} plane is 8 nm.
Keywords :
elemental semiconductors; etching; mirrors; optical fabrication; silicon; double-sided anisotropic wet etching; mirror fabrication; optical bench; size 8 nm; wafer; wet etched roughness; Geometrical optics; Mirrors; Optical device fabrication; Optical fibers; Silicon; Wet etching; <100> oriented silicon; double-sided anisotropic wet etching; optical bench; {111} mirror;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
Conference_Location :
Banff, AB
Print_ISBN :
978-1-4577-1511-2
DOI :
10.1109/OMEMS.2012.6318834
