Tailoring plasmonic field enhancement in spatial and spectral domains

Author

Juodkazis, Saulius ; Rosa, Lorenzo ; Gervinskas, Gediminas ; Brasselet, Etienne

Author_Institution

Centre for Micro-Photonics, Swinburne Univ. of Technol., Hawthorn, VIC, Australia

fYear

2012

fDate

6-9 Aug. 2012

Firstpage

134

Lastpage

135

Abstract

Three-dimensional patterning of gold nano-particles on SiO₂ and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures are demonstrated. Simulations of optical properties of the obtained nano-architectures reveal the possibility to tailor the field enhancement both in the spatial and spectral domains, which are foreseen to be applicable for light harvesting and opto-mechanics at nanoscale.

Keywords

gold; ion beam lithography; nanoparticles; nanopatterning; optical properties; plasmonics; silicon; silicon compounds; Au; Si; SiO₂; gold nanoparticles; ion-beam lithography; nanostructures; on-demand achiral modification; optical properties; plasmonic field enhancement; spatial domains; spectral domains; three-dimensional patterning; Gold; Nanoparticles; Optical device fabrication; Optical sensors; Optical surface waves; Silicon; Substrates; Plasmonics; light harvesting & enhancement; opto-mechanics;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OMN), 2012 International Conference on

Conference_Location

Banff, AB

ISSN

2160-5033

Print_ISBN

978-1-4577-1511-2

Type

conf

DOI

10.1109/OMEMS.2012.6318839

Filename

6318839