DocumentCode :
3534294
Title :
Effect of deposition in the presence of magnetic field on the magnetic properties of CVD cobalt
Author :
Deo, N. ; Bain, M.F. ; Montgomery, John H. ; Kelly, B. ; Gamble, H.S.
Author_Institution :
Sch. of Electr. & Electron. Eng., Queen´´s Univ., Belfast, UK
fYear :
2005
fDate :
4-8 April 2005
Firstpage :
937
Lastpage :
938
Abstract :
Cobalt layers are deposited in the presence of magnetic field by chemical vapor deposition (CVD). Magnetic properties of layers fabricated with and without the presence of a magnetic field are studied and compared.
Keywords :
chemical vapour deposition; cobalt; coercive force; grain size; magnetic domains; metallic thin films; CVD cobalt; Co; chemical vapor deposition; coercivity; hysteresis loop structure; magnetic domain size; magnetic field effects; magnetic properties; magnetisation; Aluminum; Cobalt; Magnetic domains; Magnetic field measurement; Magnetic fields; Magnetic flux; Magnetic force microscopy; Magnetic properties; Magnets; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
Type :
conf
DOI :
10.1109/INTMAG.2005.1463897
Filename :
1463897
Link To Document :
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