DocumentCode :
3534951
Title :
Thermal stability of SiC JFETs in conduction mode
Author :
Ouaida, Remy ; Buttay, Cyril ; Riva, Raphael ; Bergogne, Dominique ; Raynaud, C. ; Morel, Florent ; Allard, Bruno
Author_Institution :
Lab. Ampere, Univ. de Lyon, Villeurbanne, France
fYear :
2013
fDate :
2-6 Sept. 2013
Firstpage :
1
Lastpage :
8
Abstract :
Although they can operate at elevated junction temperature, silicon carbide power devices can in some cases fail, even at low ambient temperature. This destruction mechanism, called the thermal run-away, is described in the paper. Then, the sensitivity of normally-on SiC JFETs (SiCED) to this mechanism is evaluated using a model based on experimental measurements performed over a wide temperature range (from -50°C to 300°C). It is shown that above a certain current level, run-away can occur. An experimental test bench is used to validate the modelling and explore the safe-operating area of these devices. The measurements confirm the sensitivity of the device to thermal run-away. Mitigation techniques are discussed.
Keywords :
junction gate field effect transistors; silicon compounds; thermal stability; wide band gap semiconductors; JFET; SiC; conduction mode; current level; destruction mechanism; safe operating area; temperature -50 C to 300 C; thermal runaway; thermal stability; Cooling; JFETs; Resistance; Silicon carbide; Temperature; Temperature measurement; Temperature sensors; High temperature electronics; JFET; Reliability; Silicon carbide; Thermal design;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Electronics and Applications (EPE), 2013 15th European Conference on
Conference_Location :
Lille
Type :
conf
DOI :
10.1109/EPE.2013.6631881
Filename :
6631881
Link To Document :
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