Title :
Polysilicon structures for shear stress sensors
Author :
Jiang, Fukang ; Tai, Yu-Chong ; Huang, Jin-Biao ; Ho, Chih-Ming
Author_Institution :
Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA, USA
Abstract :
Four types of micromachined polysilicon structures have been designed and fabricated for wall shear stress sensors in flow measurement and control. Their frequency responses, heat transfer characteristics and wind-tunnel responses have been extensively studied. They are all useful but one may be better than the others depending on the application requirement
Keywords :
elemental semiconductors; flow measurement; frequency response; microsensors; silicon; Si; flow measurement; frequency responses; heat transfer characteristics; micromachined polysilicon structures; polysilicon structures; wall shear stress sensors; wind-tunnel responses; Bridges; Etching; Fabrication; Mechanical sensors; Stress control; Stress measurement; Substrates; Thermal sensors; Thermal stresses; Wire;
Conference_Titel :
Microelectronics and VLSI, 1995. TENCON '95., IEEE Region 10 International Conference on
Print_ISBN :
0-7803-2624-5
DOI :
10.1109/TENCON.1995.496323
