Electrodeposited Co-Ni-Re-W-P thick array of high vertical magnetic anisotropy

A material system of Co-Ni-Re-W-P thick micro-array (up to ∼90 μm) has been successfully developed by electroplating using a rotating disk electrode from the corresponding bath solution. Magnetic performance was measured by the vibrating sample magnetometer. As illustrated by the out-of-plane hysteresis curves, the electrodeposited plane film exhibits high magnetic anisotropy with a vertical remanent magnetization of ∼3.11 kG and vertical coercivity of ∼2.33 kOe. The performance of these magnetic micro-arrays demonstrates high potential for future magnetic MEMS application.