Electrodeposited Co-Ni-Re-W-P thick array of high vertical magnetic anisotropy

Author

Ng, W.B. ; Takada, A. ; Okada, K.

Author_Institution

Singapore Res. Lab., Sony Electron. (Singapore) Pte. Ltd., Singapore, Singapore

fYear

2005

fDate

4-8 April 2005

Firstpage

1283

Lastpage

1284

Abstract

A material system of Co-Ni-Re-W-P thick micro-array (up to ∼90 μm) has been successfully developed by electroplating using a rotating disk electrode from the corresponding bath solution. Magnetic performance was measured by the vibrating sample magnetometer. As illustrated by the out-of-plane hysteresis curves, the electrodeposited plane film exhibits high magnetic anisotropy with a vertical remanent magnetization of ∼3.11 kG and vertical coercivity of ∼2.33 kOe. The performance of these magnetic micro-arrays demonstrates high potential for future magnetic MEMS application.

Keywords

arrays; cobalt compounds; coercive force; electroplated coatings; magnetic anisotropy; magnetic hysteresis; magnetic thin films; nickel compounds; remanence; rhenium compounds; tungsten compounds; 90 micron; CoNiReWP; bath solution; electrodeposited Co-Ni-Re-W-P thick microarray; electrodeposited plane films; electroplating; magnetic MEMS application; magnetic microarrays; magnetic performance; out-of-plane hysteresis curves; rotating disk electrode; vertical coercivity; vertical magnetic anisotropy; vertical remanent magnetization; vibrating sample magnetometer; Coercive force; Electrodes; Magnetic anisotropy; Magnetic films; Magnetic hysteresis; Magnetic materials; Magnetization; Magnetometers; Perpendicular magnetic anisotropy; Vibration measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1464071

Filename

1464071