DocumentCode :
3536801
Title :
Modeling and Simulation of 7T SRAM Cell at Various Process Corners at 45 nm Process Technology
Author :
Mishra, Khushboo ; Akashe, Shyam
Author_Institution :
M-Tech VLSI Design, Inst. of Technol. & Manage., Gwalior, India
fYear :
2012
fDate :
7-8 Jan. 2012
Firstpage :
361
Lastpage :
363
Abstract :
Designing static random access memory cell (SRAM), low power and leakage current using nano-scale technology ranges, Low power supply voltage is an effective technique for low power reduction in memory design, however traditional memory cell design fails to operate at ultra low voltage regime, then a new cell structure need to operate cell in low voltage regime. Therefore a single ended input output 7 transistor SRAM cell for using 45nm cmos technology and it is suitable for low voltage regime. Schmitt trigger based SRAM is proposed which provide better read stability, write ability and process variation tolerance compared to standard 6 transistor SRAM cell. This technology reduces power as well leakage current and improves signal noise margin (SNM).
Keywords :
CMOS memory circuits; SRAM chips; integrated circuit design; leakage currents; low-power electronics; nanoelectronics; 7 transistor SRAM cell; 7T SRAM cell modelling; 7T SRAM cell simulation; CMOS technology; SNM; Schmitt trigger based SRAM; leakage current; low power current; low power reduction; low power supply voltage; memory cell design; nanoscale technology; signal noise margin; size 45 nm; static random access memory cell; transistor SRAM cell; Inverters; Leakage current; Low voltage; Noise; Random access memory; Transistors; Static noise margin (SNM); leakage current; power;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Computing & Communication Technologies (ACCT), 2012 Second International Conference on
Conference_Location :
Rohtak, Haryana
Print_ISBN :
978-1-4673-0471-9
Type :
conf
DOI :
10.1109/ACCT.2012.71
Filename :
6168392
Link To Document :
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