Title :
Fe-Co-B soft magnetic underlayer with radially oriented high anisotropy field for perpendicular magnetic recording disk
Author :
Ito, S. ; Nakagawa, S.
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
Abstract :
Fe-Co-B/Ni-Fe/Si films were prepared on Si wafers or glass disk substrates using a facing targets sputtering apparatus. Magnetic hysteresis characteristics show that the trilayers deposited on stationary glass disk exhibited higher coercivity and lower magnetic anisotropy field Hk comparing with that on Si wafer, and that films on rotating disk exhibited large Hk. X-ray diffraction studies reveal fcc (111) plane orientation in films on rotating disk and Si wafer, of which none was found in films on fixed disk. To conclude, it was found that the high Hk in Fe-Co-B films can be improved by increasing the deposition rate and the soft magnetic properties of Fe-Co-B/Ni-Fe/Si films, which deteriorate on glass substrates and improved by depositing them on rotating disks.
Keywords :
Permalloy; X-ray diffraction; cobalt compounds; coercive force; crystal orientation; ferromagnetic materials; iron compounds; magnetic anisotropy; magnetic hysteresis; magnetic multilayers; perpendicular magnetic recording; silicon; soft magnetic materials; sputtered coatings; FeCoB-NiFe-Si; Si; SiO2; X-ray diffraction; coercivity; deposition rate; facing targets sputtering apparatus; fcc (111) plane orientation; glass disk substrate; magnetic anisotropy field; magnetic hysteresis; magnetic properties; perpendicular magnetic recording disk; soft magnetic underlayer; Anisotropic magnetoresistance; Glass; Magnetic anisotropy; Magnetic films; Magnetic hysteresis; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Semiconductor films; Soft magnetic materials; Sputtering;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1464092