DocumentCode :
3537680
Title :
Effects of ion beam irradiation on electrical properties of Langmuir-Blodgett (LB) films
Author :
Kyokane, Jun ; Yoshimizu, Michiro ; Taniguchi, Isao ; Aoki, Yasuo ; Yoshino, Katsumi
Author_Institution :
Nara Nat. Coll. of Technol., Japan
fYear :
1995
fDate :
17-20 Sep 1995
Firstpage :
89
Lastpage :
92
Abstract :
An RF (3-heptafluoropropyle) thiophene oligomer and a TCNQ complex with different molar ratios of the donor and acceptor were prepared as conductive materials by the Langmuir-Blodgett (LB) technique. A method utilizing ion beam irradiation for improving the quality and stability of the LB films was also proposed
Keywords :
Langmuir-Blodgett films; conducting materials; electrical conductivity; ion beam effects; organic compounds; 3-heptafluoropropyle; Langmuir-Blodgett films; RF thiophene oligomer; TCNQ complex; conductive materials; donor acceptor complex; electrical properties; ion beam irradiation; Conducting materials; Conductive films; Conductivity; Electrodes; Ion beams; Ion sources; Optical devices; Optical films; Radio frequency; Thin film sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulating Materials, 1995. International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
4-88686-047-8
Type :
conf
DOI :
10.1109/ISEIM.1995.496515
Filename :
496515
Link To Document :
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