Title :
Domain wall device of Permalloy submicron half-ring in series wire
Author :
Yu, C. ; Liou, Y. ; Lee, S.F. ; Huang, E.W. ; Chen, D.C. ; Cheng, K.W. ; Yao, Y.D. ; Chan, C.R.
Author_Institution :
Inst. of Phys., Acad. Sinica, Taipei, Taiwan
Abstract :
The submicron Permalloy half-ring in series wire were fabricated. This was used to indicate different magnetic states by domain. Different magnitude longitudinal external fields were applied to the wire. The numbers of jump in the loop of magnetoresistances (MR) were different and might be the function of the maximum external field. The pattern structures of magnetic wires were fabricated by electron-beam lithography. Permalloy (Ni80Fe20) film was deposited by DC magnetron sputtering. MR measurement was made by standard 4-probe technique on two gold pads at 77 K and 300 K. Magnetic field was applied in the substrate plane. Longitudinal magnetoresistance were measured with different maximum field. From the measurements, jumps in the MR loops were observed which were attributed to domain wall depinning at the intersection of two half-ring or the domain walls were driven out of the half-ring wire.
Keywords :
Permalloy; electron beam lithography; magnetic domain walls; magnetoelectronics; magnetoresistance; sputter deposition; 77 to 300 K; DC magnetron sputtering; Ni80Fe20; Permalloy submicron half-ring; domain wall device; electron-beam lithography; magnetic wires; magnetoresistances; series wire; Iron; Lithography; Magnetic domain walls; Magnetic domains; Magnetic field measurement; Magnetic films; Magnetoresistance; Measurement standards; Sputtering; Wire;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1464189