Title :
Oblique ion nano-texturing technology for longitudinal recording media
Author :
Sato, Kenji ; Okamoto, Iwao ; Kitamoto, Y. ; Ishida, Shigesuke
Author_Institution :
Yamagata Fujitsu Ltd., Japan
Abstract :
The surface morphology induced by oblique ion beam etching (IBE) technique and the magnetic properties (radial and circumferential coercivity) of the fabricated surface were reported in this paper. A novel texturing technology using IBE for ultra-high-density longitudinal recording media was also proposed. The media structure is composed of the glass substrate and an amorphous seed layer, RuAl seed layer, Cr-Mo underlayer, Co-Cr intermediate layer, Co-Cr-Pt-B magnetic layer and C protective layer.
Keywords :
aluminium alloys; boron alloys; carbon; chromium alloys; cobalt alloys; coercive force; etching; magnetic recording; molybdenum alloys; multilayers; nanotechnology; platinum alloys; ruthenium alloys; surface morphology; surface texture; RuAl-CrMo-CoCr-CoCrPtB-C; SiO2; circumferential coercivity; magnetic properties; oblique ion beam etching; oblique ion nanotexturing technology; radial coercivity; surface morphology; ultrahigh-density longitudinal recording media; Amorphous magnetic materials; Amorphous materials; Coercive force; Etching; Glass; Identity-based encryption; Ion beams; Magnetic properties; Magnetic recording; Surface morphology;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1464302
