Oblique ion nano-texturing technology for longitudinal recording media

Author

Sato, Kenji ; Okamoto, Iwao ; Kitamoto, Y. ; Ishida, Shigesuke

Author_Institution

Yamagata Fujitsu Ltd., Japan

fYear

2005

fDate

4-8 April 2005

Firstpage

1737

Lastpage

1738

Abstract

The surface morphology induced by oblique ion beam etching (IBE) technique and the magnetic properties (radial and circumferential coercivity) of the fabricated surface were reported in this paper. A novel texturing technology using IBE for ultra-high-density longitudinal recording media was also proposed. The media structure is composed of the glass substrate and an amorphous seed layer, RuAl seed layer, Cr-Mo underlayer, Co-Cr intermediate layer, Co-Cr-Pt-B magnetic layer and C protective layer.

Keywords

aluminium alloys; boron alloys; carbon; chromium alloys; cobalt alloys; coercive force; etching; magnetic recording; molybdenum alloys; multilayers; nanotechnology; platinum alloys; ruthenium alloys; surface morphology; surface texture; RuAl-CrMo-CoCr-CoCrPtB-C; SiO₂; circumferential coercivity; magnetic properties; oblique ion beam etching; oblique ion nanotexturing technology; radial coercivity; surface morphology; ultrahigh-density longitudinal recording media; Amorphous magnetic materials; Amorphous materials; Coercive force; Etching; Glass; Identity-based encryption; Ion beams; Magnetic properties; Magnetic recording; Surface morphology;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1464302

Filename

1464302