Title :
Interfacial mixing behavior of Fe/Al magnetic thin films: molecular dynamics simulation
Author :
Chan-Yeup Chung ; Chung, Chan-Yeup
Author_Institution :
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
Abstract :
The deposition behavior of Fe adatoms on Al [001] substrates was qualitatively investigated using molecular dynamics simulation to elucidate interface properties. The mixing phenomena originated from atomistic penetration and mutual diffusion. It was inferred that interfacial mixing was insensitive of the change in the initial kinetic energy of adatoms but strongly dependent on substrate temperature.
Keywords :
adsorbed layers; adsorption; aluminium; chemical interdiffusion; ferromagnetic materials; iron; magnetic thin films; mixing; molecular dynamics method; Al; Fe; Fe-Al; adatoms; atomistic penetration; interface properties; interfacial mixing; kinetic energy; magnetic thin films; molecular dynamics simulation; mutual diffusion; substrate temperature; Acceleration; Artificial intelligence; Atomic layer deposition; Atomic measurements; Ceramics; Iron; Kinetic energy; Magnetic films; Surface cleaning; Surface morphology;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1464350
