DocumentCode
3539409
Title
Interfacial mixing behavior of Fe/Al magnetic thin films: molecular dynamics simulation
Author
Chan-Yeup Chung ; Chung, Chan-Yeup
Author_Institution
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
fYear
2005
fDate
4-8 April 2005
Firstpage
1833
Lastpage
1834
Abstract
The deposition behavior of Fe adatoms on Al [001] substrates was qualitatively investigated using molecular dynamics simulation to elucidate interface properties. The mixing phenomena originated from atomistic penetration and mutual diffusion. It was inferred that interfacial mixing was insensitive of the change in the initial kinetic energy of adatoms but strongly dependent on substrate temperature.
Keywords
adsorbed layers; adsorption; aluminium; chemical interdiffusion; ferromagnetic materials; iron; magnetic thin films; mixing; molecular dynamics method; Al; Fe; Fe-Al; adatoms; atomistic penetration; interface properties; interfacial mixing; kinetic energy; magnetic thin films; molecular dynamics simulation; mutual diffusion; substrate temperature; Acceleration; Artificial intelligence; Atomic layer deposition; Atomic measurements; Ceramics; Iron; Kinetic energy; Magnetic films; Surface cleaning; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1464350
Filename
1464350
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