DocumentCode
3540437
Title
Fabrication of two dimensional magnetophotonic crystal by selective-area sputter epitaxy
Author
Park, J.H. ; Fujikawa, R. ; Kazuhiro, N. ; Uchida, H. ; Inoue, M.
Author_Institution
Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Japan
fYear
2005
fDate
4-8 April 2005
Firstpage
2089
Lastpage
2090
Abstract
This study demonstrates the fabrication of 2D magnetophotonic crystal (MPC) by selective-area sputter epitaxy (SASE) of iron-garnet film, (BiYDy)3(FeAl)5O12 for the first time. This fabrication method overcomes the disadvantages associated with groove etching due to underetching and nonplanar surface topology.
Keywords
bismuth compounds; dysprosium compounds; magneto-optical effects; optical fabrication; optical films; photonic crystals; sputter deposition; yttrium compounds; (BiYDy)3(FeAl)5O12; groove etching; iron-garnet film; nonplanar surface topology; selective-area sputter epitaxy; two dimensional magnetophotonic crystal; Amorphous magnetic materials; Artificial intelligence; Epitaxial growth; Magnetic domains; Magnetic films; Optical device fabrication; Optical films; Optical waveguides; Photonic crystals; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1464483
Filename
1464483
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