• DocumentCode
    3541188
  • Title

    Observation of negative differential conductance in nanoscale p-n junctions

  • Author

    Purwiyanti, Sri ; Moraru, Daniel ; Mizuno, Takayuki ; Tabe, Michiharu ; Hartanto, Djoko

  • Author_Institution
    Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
  • fYear
    2013
  • fDate
    25-28 June 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Recently p-n junction characteristics in nanometer scale have been investigated in relation with photonics and electronics applications. In this paper, we report the experimental observation of negative differential conductance (NDC), the basic indication of tunneling, in nanoscale p-n junctions under forward bias condition. The NDC has been observed only at low temperatures, suggesting that tunneling is mediated by some states in the band gap, most likely by individual dopants with deeper energy levels compared to bulk. Furthermore, we also observed random telegraph signal (RTS) at low temperatures, which is ascribed to sudden changes of charge states of an individual dopant. These results illustrate the nature of individual dopants in nanoscalep-n junctions and their impact on device characteristics.
  • Keywords
    energy gap; p-n junctions; silicon-on-insulator; tunnelling; band gap; electronics applications; energy level; nanoscale p-n junctions; negative differential conductance; photonics applications; random telegraph signal; tunneling; Current measurement; Nanoscale devices; Nanowires; P-n junctions; Temperature; Temperature measurement; Tunneling; NDC; individual dopant; nanoscale p-n junction; tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    QiR (Quality in Research), 2013 International Conference on
  • Conference_Location
    Yogyakarta
  • Print_ISBN
    978-1-4673-5784-5
  • Type

    conf

  • DOI
    10.1109/QiR.2013.6632532
  • Filename
    6632532