DocumentCode
3541188
Title
Observation of negative differential conductance in nanoscale p-n junctions
Author
Purwiyanti, Sri ; Moraru, Daniel ; Mizuno, Takayuki ; Tabe, Michiharu ; Hartanto, Djoko
Author_Institution
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
fYear
2013
fDate
25-28 June 2013
Firstpage
1
Lastpage
4
Abstract
Recently p-n junction characteristics in nanometer scale have been investigated in relation with photonics and electronics applications. In this paper, we report the experimental observation of negative differential conductance (NDC), the basic indication of tunneling, in nanoscale p-n junctions under forward bias condition. The NDC has been observed only at low temperatures, suggesting that tunneling is mediated by some states in the band gap, most likely by individual dopants with deeper energy levels compared to bulk. Furthermore, we also observed random telegraph signal (RTS) at low temperatures, which is ascribed to sudden changes of charge states of an individual dopant. These results illustrate the nature of individual dopants in nanoscalep-n junctions and their impact on device characteristics.
Keywords
energy gap; p-n junctions; silicon-on-insulator; tunnelling; band gap; electronics applications; energy level; nanoscale p-n junctions; negative differential conductance; photonics applications; random telegraph signal; tunneling; Current measurement; Nanoscale devices; Nanowires; P-n junctions; Temperature; Temperature measurement; Tunneling; NDC; individual dopant; nanoscale p-n junction; tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
QiR (Quality in Research), 2013 International Conference on
Conference_Location
Yogyakarta
Print_ISBN
978-1-4673-5784-5
Type
conf
DOI
10.1109/QiR.2013.6632532
Filename
6632532
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