DocumentCode :
35415
Title :
Mechanism of Triple Ions Effect in GeSO Resistance Random Access Memory
Author :
Wei Zhang ; Ying Hu ; Ting-Chang Chang ; Tsung-Ming Tsai ; Kuan-Chang Chang ; Hsin-Lu Chen ; Yu-Ting Su ; Rui Zhang ; Ya-Chi Hung ; Yong-En Syu ; Min-Chen Chen ; Jin-Cheng Zheng ; Hua-Ching Lin ; Sze, Simon M.
Author_Institution :
Sch. of Adv. Mater. & Nanotechnol., Xidian Univ., Xi´an, China
Volume :
36
Issue :
6
fYear :
2015
fDate :
Jun-15
Firstpage :
552
Lastpage :
554
Abstract :
In this letter, a triple-ion redox reaction has been proposed and investigated in GeSO-based resistance random access memory. Continuous multiresistance states can be obtained by applying a series of increasing cutoff voltages in both set and reset processes. Using data retention tests, these multistates in the set and reset processes were confirmed to be stable. The conduction mechanism gradually changed during reset process from space charge limited current to Schottky emission. A triple-ion reaction model has been proposed to reveal the chemical reaction properties in the resistive switching process.
Keywords :
germanium compounds; oxidation; resistive RAM; space charge; GeSO; Schottky emission; chemical reaction properties; data retention tests; random access memory; resistive switching process; space charge limited current; triple ions effect; triple-ion redox reaction; Fitting; Ions; Nonvolatile memory; Random access memory; Resistance; Switches; Tin; RRAM; Schottky emission; Space-Charge Limited-Current; multi-state; space-charge limited-current; triple ions effect;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2424996
Filename :
7090948
Link To Document :
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