DocumentCode :
3541513
Title :
3D NEGF simulation of ‘ab initio’ scattering from discrete dopants in the source and drain of a nanowire transistor
Author :
Seoane, N. ; Martinez, A. ; Brown, A.R. ; Barker, J.R. ; Asenov, A.
Author_Institution :
Dept. Electron. & Comput. Sci., Univ. Santiago de Compostela, Santiago de Compostela, Spain
fYear :
2008
fDate :
15-16 June 2008
Firstpage :
1
Lastpage :
2
Abstract :
In this paper we study the fluctuations in the I-V characteristics due to coherent scattering off different configurations of discrete dopants in the source/drain of an extremely thin Si nanowire transistor. The self-consistent screening potential at the impurities is calculated using a full 3D NEGF formalism coupled to the 3D solution of the Poisson equation [3]. The fluctuations in the I-V characteristics can be understood by examining the energy dependence of the transmission coefficients. We show that the effective potential presented to electrons by a positively charged ionised donor does not necessarily have the simple form of an attractive screened Coulomb potential. Instead, the self-consistent electrostatics leads to an effective potential that resembles an inverted sombrero: the core is Coulomb like, but the radial dependence rises through a maximum before flattening to an asymptotically zero value. This maximum introduces quasi-bound (resonant tunnelling) states. For the first time, we demonstrate the effects of the sombrero potential on scattering and ultimately device current transmission. The whole screening occurs due to electrons congregating in the quasi-bound states of the sombrero potential
Keywords :
Poisson equation; transistors; 3D NEGF simulation; Coulomb like; Coulomb potential; I-V characteristics; Poisson equation; coherent scattering; discrete dopants; nanowire transistor; quasi-bound states; resonant tunnelling states; sombrero potential; transmission coefficients; Current measurement; Electrons; Germanium silicon alloys; Heart; Isotopes; Modems; Physics; Quantum dots; Scattering; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon Nanoelectronics Workshop, 2008. SNW 2008. IEEE
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-2071-1
Type :
conf
DOI :
10.1109/SNW.2008.5418462
Filename :
5418462
Link To Document :
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