DocumentCode
3542039
Title
Study of field plate effects onAlGaN/GaN HEMTs
Author
Kaddeche, M. ; Telia, A. ; Soltani, A.
Author_Institution
Electron. Dept., Mentouri Univ. of Constantine, Constantine, Algeria
fYear
2009
fDate
19-22 Dec. 2009
Firstpage
362
Lastpage
365
Abstract
In this paper we carry out study of the Field Plate (FP) effects on AlGaN/GaN HEMTs (high electron mobility transistors) by modeling the electric field in the structure FP-HEMT (with Field Plate). It consist to analyze the maximum of the electric field according to the gate voltage and drain voltage taking into account several technological parameters of the Field Plate such as the passivation layer thickness, the FP length and the distance gate-drain. We have shown that, the main functions of the field plate are to reshape the electric field distribution in the channel and to reduce its peak value on the drain side of the gate edge. The benefit is an increase of the breakdown voltage and a reduced high-field trapping effect.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device breakdown; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; HEMTs; breakdown voltage; drain voltage; electric field distribution; field plate effects; gate voltage; high electron mobility transistors; passivation layer thickness; reduced high-field trapping effect; structure FP-HEMT; Aluminum gallium nitride; Electrodes; Gallium nitride; HEMTs; Insulation; MODFETs; Passivation; Piezoelectric polarization; Thermal conductivity; Voltage; AlGaN/GaN; field distribution; field plate; high electron mobility transistor (HEMT);
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics (ICM), 2009 International Conference on
Conference_Location
Marrakech
Print_ISBN
978-1-4244-5814-1
Type
conf
DOI
10.1109/ICM.2009.5418607
Filename
5418607
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