DocumentCode
3542049
Title
Aqueous electrolyte system for porous silicon using electrochemical anodization
Author
Manoj, K.C. ; Dubey, Manisha ; Bills, B. ; Al-Qaradawi, Ilham Y. ; Lamsal, Buddhi Sagar ; Galipeau, David ; Qi Hua Fan
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., South Dakota State Univ., Brookings, SD, USA
fYear
2013
fDate
9-11 May 2013
Firstpage
1
Lastpage
4
Abstract
Electrochemical anodization on n-type silicon was performed with silicon as anode and platinum as cathode in a weak-acid aqueous electrolyte containing orthophosphoric acid and ammonium fluoride. Anodization was carried out in two different modes, i.e., potentiostatic and galvanostatic with the voltage and current density of 5-80 V and 10-50 mA/cm2 respectively. Anodization time was varied from 5 min to 10 hours. Morphology of the anodized samples was studied using scanning electron microscopy (SEM), revealing the formation of pores with uniform distribution throughout the silicon substrate. The pore size and density were controllable by varying the anodization voltage and current. Results showed that, in a broad spectrum range of 400-1100 nm, the total reflectance (sum of diffused and specular reflectance) of the porous silicon was about 10% compared to >30% of the as-received silicon wafer. The porous silicon is promising for solar cell applications due to the low reflection loss.
Keywords
anodes; anodisation; cathodes; current density; density; electrochemical electrodes; electrolytes; elemental semiconductors; porosity; porous semiconductors; reflectivity; scanning electron microscopy; silicon; surface morphology; SEM; Si; ammonium fluoride; anode; cathode; current density; density; electrochemical anodization; galvanostatic mode; morphology; orthophosphoric acid; porosity; porous n-type silicon; potentiostatic mode; scanning electron microscopy; specular reflectance; time 5 min to 10 h; total reflectance; weak-acid aqueous electrolyte; Morphology; Photovoltaic cells; Reflectivity; Scanning electron microscopy; Silicon; Substrates; Surface morphology; Anodization; Electerochemical Etching; Porous silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electro/Information Technology (EIT), 2013 IEEE International Conference on
Conference_Location
Rapid City, SD
ISSN
2154-0357
Print_ISBN
978-1-4673-5207-9
Type
conf
DOI
10.1109/EIT.2013.6632656
Filename
6632656
Link To Document