Title :
A 22nm SoC platform technology featuring 3-D tri-gate and high-k/metal gate, optimized for ultra low power, high performance and high density SoC applications
Author :
Jan, C.-H. ; Bhattacharya, Ujjwal ; Brain, R. ; Choi, Sung-Jin ; Curello, G. ; Gupta, Gaurav ; Hafez, W. ; Jang, Minsoo ; Kang, Myeongsu ; Komeyli, K. ; Leo, Tommaso ; Nidhi, N. ; Pan, L. ; Park, Jongho ; Phoa, K. ; Rahman, Aminur ; Staus, C. ; Tashiro, H
Author_Institution :
Logic Technol. Dev., Intel Corp., Hillsboro, OR, USA
Abstract :
A leading edge 22nm 3-D tri-gate transistor technology has been optimized for low power SoC products for the first time. Low standby power and high voltage transistors exploiting the superior short channel control, <; 65mV/dec subthreshold slope and <;40mV DIBL, of the Tri-Gate architecture have been fabricated concurrently with high speed logic transistors in a single SoC chip to achieve industry leading drive currents at record low leakage levels. NMOS/PMOS Idsat=0.41/0.37mA/um at 30pA/um Ioff, 0.75V, were used to build a low standby power 380Mb SRAM capable of operating at 2.6GHz with 10pA/cell standby leakages. This technology offers mix-and-match flexibility of transistor types, high-density interconnect stacks, and RF/mixed-signal features for leadership in mobile, handheld, wireless and embedded SoC products.
Keywords :
SRAM chips; high-k dielectric thin films; integrated circuit interconnections; low-power electronics; system-on-chip; 3D trigate transistor technology; NMOS-PMOS; RF-mixed-signal features; embedded products; frequency 2.6 GHz; handheld products; high density SoC applications; high speed logic transistors; high voltage transistors; high-density interconnect stacks; high-k-metal gate; industry leading drive currents; low standby power; low standby power SRAM; mix-and-match flexibility; mobile products; record low leakage levels; short channel control; size 22 nm; standby leakages; subthreshold slope; transistor types; ultra low power applications; voltage 0.75 V; wireless products; Computer architecture; Logic gates; MOS devices; Metals; Random access memory; System-on-chip; Transistors;
Conference_Titel :
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4673-4872-0
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2012.6478969