DocumentCode :
3543683
Title :
High-power 650-nm laser diodes grown by solid-source molecular beam epitaxy
Author :
Toivonen, M. ; Savolainen, P. ; Jalonen, M. ; Salokatve, A. ; Dumitrescu, M. ; Pessa, M. ; Corvini, P.J. ; Fang, F. ; Jansen, M. ; Nabiev, R.F.
Author_Institution :
Dept. of Phys., Tampere Univ. of Technol., Finland
fYear :
1998
fDate :
3-8 May 1998
Firstpage :
284
Abstract :
Summary form only given. Nearly 1 W cw power at 25 C was obtained from a 50-/spl mu/m broad-area InGaP SQW laser emitter operating at 652 nm. The devices were grown by solid source molecular beam epitaxy (SSMBE) and offer the possibility of a compact source suitable for photodynamic therapy.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; infrared sources; laser transitions; molecular beam epitaxial growth; optical fabrication; quantum well lasers; semiconductor growth; 25 C; 50 mum; 650 nm; 652 nm; InGaP; MBE; broad-area InGaP SQW laser emitter; compact source; cw power; high-power 650-nm laser diodes; photodynamic therapy; solid source molecular beam epitaxy; solid-source molecular beam epitaxy; Current measurement; Diode lasers; Molecular beam epitaxial growth; Optical fiber devices; Optical materials; Power generation; Pulse measurements; Substrates; Temperature dependence; Threshold current;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-339-0
Type :
conf
DOI :
10.1109/CLEO.1998.676173
Filename :
676173
Link To Document :
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