DocumentCode :
3543829
Title :
High efficiency silicon and Germanium stack junction solar cells
Author :
Dongkyun Kim ; Youngmoon Choi ; Eun Cheol Do ; Yeonil Lee ; Yun Gi Kim
Author_Institution :
Energy Lab., Samsung Adv. Inst. of Technol., Yongin, South Korea
fYear :
2012
fDate :
10-13 Dec. 2012
Abstract :
We have fabricated Si/Ge stack junction solar cells in order to overcome silicon single junction limit efficiency. Ge cell can absorb long wavelength photons that cannot be absorbed in Si. Bottom Ge solar cell can theoretically yield additional 5% efficiency to Si top cell. We have fabricated 21.3% top Si / 1.6% bottom Ge stack junction with 22.9% module efficiency. SiO2 and SiNx double insulating interlayers were optimized in order to transmit long wavelength photon to the Ge cell and achieve good passivation at the interlayer. The stack junction will be able to overcome the Si practical efficiency limit of 26% in the near future, and be the candidate for the next generation crystalline Si solar cell.
Keywords :
germanium; silicon; solar cells; Si-Ge; crystalline silicon solar cell; double insulating interlayers; high efficiency silicon-germanium stack junction solar cells; module efficiency; passivation; silicon single junction limit efficiency; stack junction; wavelength photons; Junctions; Optical surface waves; Passivation; Photovoltaic cells; Silicon; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4673-4872-0
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2012.6479032
Filename :
6479032
Link To Document :
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