DocumentCode :
3544420
Title :
Retention time characterization and optimization of logic-compatible embedded DRAM cells
Author :
Do, Anh Tuan ; Yi, He ; Yeo, Kiat Seng ; Kim, Tony T.
Author_Institution :
IC Design Centre of Excellence, Nanyang Technol. Univ., Singapore, Singapore
fYear :
2012
fDate :
10-11 July 2012
Firstpage :
29
Lastpage :
34
Abstract :
Logic-compatible 2T and 3T embedded DRAMs (eDRAM) have recently gained their popularity in embedded applications because of their high density and good voltage margin. The most important design requirements in eDRAM cells are cell area, data retention time and read speed. In this paper, we present an in-depth analysis on the data retention time of various logic-compatible eDRAM cells, followed by the effects of several design factors on the retention time. A systematic methodology is proposed for enhancing the retention time of the eDRAM cells. Simulation results using a standard 65nm CMOS technology show that the optimization process improves the data retention time more than 3×. Finally, the number of read operations per retention period is estimated to show the effectiveness of each eDRAM cell. Analysis demonstrates that although the 2T eDRAM cell has a shorter retention time than the conventional 3T cell, it has better effectiveness due to the faster read operation.
Keywords :
CMOS memory circuits; DRAM chips; embedded systems; integrated circuit design; logic circuits; logic design; optimisation; data retention time analysis; logic-compatible 2T embedded DRAM cell optimization; logic-compatible 3T embedded DRAM cell optimization; size 65 nm; standard CMOS technology; Layout; Leakage current; Logic gates; MOS devices; Optimization; Steady-state; Transistors; Embedded DRAM; gain cell; retention time;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design (ASQED), 2012 4th Asia Symposium on
Conference_Location :
Penang
Print_ISBN :
978-1-4673-2687-2
Type :
conf
DOI :
10.1109/ACQED.2012.6320471
Filename :
6320471
Link To Document :
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