Application of optical scatterometry to microelectronics processing

Summary form only given. We have shown the applicability of optical scatterometry to provide a metrology technique that satisfies many, and sometimes all, of the requirements needed. Scatterometry is a two-step process in which a sample having periodic structure is illuminated. The diffraction characteristics are extremely sensitive to the dimensional and optical structure of the sample. The diffraction is first characterized as a function of measurement parameters (e.g., angle of incidence). The second step is to analyze the diffraction characteristics to determine the structure characteristics. We have applied this technique to characterize samples from several phases of microelectronics and flat panel display processing.