DocumentCode :
3544597
Title :
Experimental study of self-heating effect (SHE) in SOI MOSFETs: Accurate understanding of temperatures during AC conductance measurement, proposals of 2ω method and modified pulsed IV
Author :
Beppu, N. ; Oda, Shoichiro ; Uchida, Kazunori
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Tokyo, Japan
fYear :
2012
fDate :
10-13 Dec. 2012
Abstract :
In this paper, a new method for accurate characterization of MOSFETs´ thermal properties is proposed. First, experimental verification of conventional AC conductance technique is conducted. We developed novel measurement techniques composed of AC conductance technique and four-probe gate resistance method. Using the new technique, it is clarified that MOSFETs´ channel temperature under AC conductance measurement is not isothermal because of “Static SHE”, and that AC conductance technique is not suitable for complete thermal characterization. Next, we modified conventional pulsed IV method. It enables us to determine accurate channel thermal resistance and to obtain isothermal IV curve. The new pulsed IV method enables to measure accurate thermal properties of the devices.
Keywords :
MOSFET; electric admittance measurement; silicon-on-insulator; thermal properties; 2ω method; AC conductance measurement; SOI MOSFET; accurate thermal property measurement; channel thermal resistance; four-probe gate resistance method; isothermal IV curve; modified pulsed IV method; self-heating effect; static SHE; Electrical resistance measurement; Frequency measurement; Hafnium; Isothermal processes; Logic gates; Resistance; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4673-4872-0
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2012.6479120
Filename :
6479120
Link To Document :
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