DocumentCode
3544598
Title
Visualization and control of Si nanoparticle behavior in laser-ablation plume
Author
Muramoto, J. ; Nakata, Y. ; Okada, T. ; Maeda, M.
Author_Institution
Graduate Sch. of Inf. Sci. & Electr. Eng., Kyushu Univ., Fukuoka, Japan
fYear
1998
fDate
3-8 May 1998
Firstpage
357
Lastpage
358
Abstract
Summary form only given. Laser ablation has been widely used to generate the luminescent Si nanoparticles. The details of the nanoparticle formation process have not been well understood. The formation process is usually controlled by changing the ablation conditions such as the position of the substrate, ambient gas pressure, and laser fluence for the ablation. In this study, we investigated an influence of applied electric field on nanoparticle behavior near the substrate to establish an active control means for the nanoparticle deposition process. The behavior of nanoparticles and Si atoms under various deposition conditions was investigated by Rayleigh scattering and laser-induced fluorescence imaging systems.
Keywords
CCD image sensors; Rayleigh scattering; fluorescence; nanostructured materials; photoluminescence; pulsed laser deposition; silicon; CCD image sensors; Rayleigh scattering; Si; Si nanoparticle behavior; ablation conditions; active control; ambient gas pressure; applied electric field; laser ablation; laser ablation deposition; laser fluence; laser-ablation plume; laser-induced fluorescence imaging systems; luminescent Si nanoparticles; nanoparticle deposition process; nanoparticle formation; visualization; Atomic beams; Atomic layer deposition; Gas lasers; Laser ablation; Nanoparticles; Optical control; Pressure control; Process control; Rayleigh scattering; Visualization;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-339-0
Type
conf
DOI
10.1109/CLEO.1998.676296
Filename
676296
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