• DocumentCode
    3544598
  • Title

    Visualization and control of Si nanoparticle behavior in laser-ablation plume

  • Author

    Muramoto, J. ; Nakata, Y. ; Okada, T. ; Maeda, M.

  • Author_Institution
    Graduate Sch. of Inf. Sci. & Electr. Eng., Kyushu Univ., Fukuoka, Japan
  • fYear
    1998
  • fDate
    3-8 May 1998
  • Firstpage
    357
  • Lastpage
    358
  • Abstract
    Summary form only given. Laser ablation has been widely used to generate the luminescent Si nanoparticles. The details of the nanoparticle formation process have not been well understood. The formation process is usually controlled by changing the ablation conditions such as the position of the substrate, ambient gas pressure, and laser fluence for the ablation. In this study, we investigated an influence of applied electric field on nanoparticle behavior near the substrate to establish an active control means for the nanoparticle deposition process. The behavior of nanoparticles and Si atoms under various deposition conditions was investigated by Rayleigh scattering and laser-induced fluorescence imaging systems.
  • Keywords
    CCD image sensors; Rayleigh scattering; fluorescence; nanostructured materials; photoluminescence; pulsed laser deposition; silicon; CCD image sensors; Rayleigh scattering; Si; Si nanoparticle behavior; ablation conditions; active control; ambient gas pressure; applied electric field; laser ablation; laser ablation deposition; laser fluence; laser-ablation plume; laser-induced fluorescence imaging systems; luminescent Si nanoparticles; nanoparticle deposition process; nanoparticle formation; visualization; Atomic beams; Atomic layer deposition; Gas lasers; Laser ablation; Nanoparticles; Optical control; Pressure control; Process control; Rayleigh scattering; Visualization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    1-55752-339-0
  • Type

    conf

  • DOI
    10.1109/CLEO.1998.676296
  • Filename
    676296