Title :
Improved reliability and switching performance of atom switch by using ternary Cu-alloy and RuTa electrodes
Author :
Tada, Mitsunori ; Sakamoto, Takanori ; Banno, N. ; Okamoto, K. ; Miyamura, Makoto ; Iguchi, Noriyuki ; Hada, Hiromitsu
Author_Institution :
Low-Power Electron. Assoc. & Project (LEAP), Tsukuba, Japan
Abstract :
For the first time, Cu(AlTi)-alloy active-electrode coupled with RuTa inert-electrode is proposed to improve the reliability of nonvolatile Cu atom switch. The remarkably high rupture temperature (Tr >400oC) of the nanometer-scale Cu bridge with the high thermal resistance (Rth) is realized by the Cu-alloy without increasing programming current. The anti-Cu diffusive, RuTa-alloy improves the retention of the ON-state at 150oC and endurance to >104 cycles. The metallurgical prescription is a key to improve the reliability and switching performance of the conducting bridge.
Keywords :
aluminium alloys; bridge circuits; copper alloys; nanoelectronics; rubidium alloys; semiconductor device reliability; semiconductor switches; tantalum alloys; ternary semiconductors; thermal resistance; titanium alloys; CuAlTi; ON-state; RuTa; active-electrode; conducting bridge; inert-electrode; metallurgical prescription; nanometer-scale bridge; nonvolatile atom switch; programming current; reliability; rupture temperature; switching performance; temperature 150 C; ternary electrode; thermal resistance; Atomic layer deposition; Bridge circuits; Bridges; Electrodes; Reliability; Switches; Switching circuits;
Conference_Titel :
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4673-4872-0
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2012.6479133