DocumentCode :
3545697
Title :
Advanced electrostatic plasma diagnostic using sideband floating harmonic method
Author :
Kim, D.H. ; Lee, Hee Chul ; Kim, Yong Sin ; Chung, C.W.
Author_Institution :
Dept. of Nanoscale Semicond. Eng., Hanyang Univ., Seoul, South Korea
fYear :
2013
fDate :
16-21 June 2013
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Single Langmuir probe (SLP) is one of the well-known electrostatic diagnostic methods, which can measure various plasma parameters, such as electron temperature, plasma density, and plasma potential. However, the SLP cannot be applied in some plasmas, such as dust plasmas and processing plasmas containing deposition gases or dust particles, without probe tip cleaning. To overcome the weakness of the SLP, a floating harmonic method (FHM) has been recently developed and extended researches based on the FHM have been studied. This FHM measures plasma parameters using the relation between a fundamental frequency current and a second harmonic current, and thus, a careful consideration for the stray current is needed when the FHM is used. In this study, a sideband method (SBM), which is based on the FHM but no consideration of the stray current, is studied and the comparisons of the measured electron temperature and the plasma density from the conventional FHM and the SBM are investigated. The SBM can be helpful to the plasma diagnostics for the large-area plasma reactor or fusion device reactor, which has a long measurement cable length or a large amount of the stray current.
Keywords :
Langmuir probes; dusty plasmas; plasma density; plasma temperature; plasma transport processes; Langmuir probe; deposition gases; dust particles; dust plasmas; electron temperature; electrostatic diagnostic methods; electrostatic plasma diagnostic; fundamental frequency current; fusion device reactor; large-area plasma reactor; plasma density; plasma parameters; plasma potential; probe tip cleaning; second-harmonic current; sideband floating harmonic method; Current measurement; Electrostatics; Harmonic analysis; Plasma measurements; Plasmas; Semiconductor device measurement; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2013.6633365
Filename :
6633365
Link To Document :
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