Electron Energy Distribution Function measurements in a low pressure expanding plasma jet

Streaming plasmas operating at low pressures can be viewed as high-current density, fully space-charge-compensated and charged particles (electrons, ions) sources. Because of these features, some applications as thin-film deposition, etching, ion nitriding and spectroscopic light sources are based on this discharge type. For a given application, it is desirable to control both the absolute and relative concentration of the active species (neutral particles and ions) in order to establish the best process conditions. The electron energy distribution function (EEDF) is closely associated with the rates of the major elementary processes, particle and power balance in the discharge, and it determines the global stability and operational properties of the plasma. Control of the EEDF is, thus, one of the major challenges in the application of chemically active plasmas in the microelectronic and other industries. Prediction of the evolution of the EEDF is crucial for fine-tuning the complex plasma.