Title :
Resolution limits of photorefractive MQW devices
Author :
Abeeluck, A. ; Canoglu, E. ; Garmire, E. ; Tayebati, P. ; Sacks, R.N.
Author_Institution :
Thayer Sch. of Eng., Dartmouth Coll., Hanover, NH, USA
Abstract :
Summary form only given. Photorefractive multiple-quantum-well (MQW) devices, attractive for two-dimensional optical information processing systems, have shown poor resolution, mostly due to lateral drift. Adding traps throughout the MQW layer improves the resolution. This paper demonstrates that low-temperature (LT) grown quantum wells can reach the fundamental resolution limit, which we have theoretically derived. Furthermore, because traps reduce the diffraction efficiency by reducing longitudinal transport, we have also investigated geometries that utilize conductive MQW with several localized trapping layers. The devices are based on a p-i-n structure grown on a Bragg reflector, with an intrinsic layer that contains MQW sandwiched between LT AlGaAs cladding layers.
Keywords :
carrier mobility; claddings; epitaxial growth; optical resolving power; photorefractive materials; semiconductor growth; semiconductor superlattices; Bragg reflector; LT AlGaAs cladding layers; MQW layer traps; conductive MQW; diffraction efficiency; fundamental resolution limit; geometries; intrinsic layer; lateral drift; localized trapping layers; longitudinal transport; low-temperature grown quantum wells; p-i-n structure; photorefractive MQW devices; photorefractive multiple-quantum-well devices; resolution limits; two-dimensional optical information processing systems; Diffraction gratings; Nonlinear optics; Optical diffraction; Optical mixing; Optical pulses; Optical refraction; Optical variables control; Pattern analysis; Photorefractive effect; Quantum well devices;
Conference_Titel :
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-339-0
DOI :
10.1109/CLEO.1998.676497