Title :
Decomposition of perfluorooctane sulfonate in water using multiple plasmas
Author :
Obo, Hayato ; Takeuchi, N. ; Yasuoka, Koichi
Author_Institution :
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Tokyo, Japan
Abstract :
In recent years, restraining and reduction of the use of perfluorocompounds (PFCs) have been required as a result of rising of environmental awareness. Perfluorooctanesulfonic acid (PFOS): one of the PFCs, is widely used for industrial and commercial products such as foam fire-extinguisher and coating agents for semiconductors because of its chemical stability and physical characteristics. However, PFOS is remarkably stable and remain in the environment. Moreover, PFOS is not decomposed by conventional methods such as advanced oxidation process (AOP), which involves the use of hydroxyl radicals. Although PFOS have been decomposed by photochemical decomposition, the energy efficiency and decomposition rate are challenges.
Keywords :
decomposition; energy conservation; environmental factors; organic compounds; oxidation; plasma; reduction (chemical); stability; water; AOP; PFC usage reduction; PFOS; advanced oxidation process; chemical stability; coating agents; commercial products; energy efficiency; foam fire extinguisher; industrial products; multiple plasmas; perfluorocompound; perfluorooctane sulfonate; perfluorooctanesulfonic acid; photochemical decomposition; water; Coatings; Electrodes; Electronic ballasts; Energy efficiency; Inductors; Plasmas; Resistors;
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/PLASMA.2013.6633434