Title :
High power pulse plasma generator with oscillatory voltage waveforms for magnetron sputtering applications
Author :
Chistyakov, Roman ; Abraham, Bassam
Author_Institution :
Zond Inc. /Zpulser LLC, Mansfield, MA, USA
Abstract :
Magnetron sputtering technology is widely used for the deposition of thin films for different applications. The properties of the sputtered films (metal, oxides, and nitrides) strongly depend on magnetron plasma density during the deposition process.
Keywords :
sputter deposition; sputtered coatings; HIPIMS; high power impulse magnetron sputtering; high power pulse plasma generator; magnetron plasma density; magnetron sputtering technology; oscillatory voltage waveforms; sputtered thin films; target power density; voltage 1000 V to 2000 V; Magnetic films; Magnetic properties; Metals; Plasma properties; Shape; Sputtering;
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/PLASMA.2013.6633435
